The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

May. 19, 2014
Applicant:

Tokyo Electron Limited, Minato-ku, JP;

Inventors:

Ikuo Sawada, Nirasaki, JP;

Sumie Nagaseki, Nirasaki, JP;

Kyoko Ikeda, Nirasaki, JP;

Tatsuro Ohshita, Nirasaki, JP;

Assignee:

TOKYO ELECTRON LIMITED, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01H 21/02 (2006.01); H01L 21/02 (2006.01); C23C 16/448 (2006.01); H01L 21/316 (2006.01); H01L 21/318 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02271 (2013.01); C23C 16/4486 (2013.01); H01L 21/02181 (2013.01); H01L 21/3185 (2013.01); H01L 21/31612 (2013.01); H01L 21/31645 (2013.01);
Abstract

A vaporizing unit, in supplying a gas material produced by vaporizing a liquid material onto a substrate to conduct a film forming process, can vaporize the liquid material with high efficiency to suppress generation of particles. With the vaporizing unit, positively or negatively charged bubbles, which have a diameter of 1000 nm or less, are produced in the liquid material, and the liquid material is atomized to form a mist of the liquid material. Further, the mist of the liquid material is heated and vaporized. The fine bubbles are uniformly dispersed in advance in the liquid material, so that very fine and uniform mist particles of the liquid material are produced when the liquid material is atomized, which makes heat exchange readily conducted. By vaporizing the mist of the liquid material, vaporization efficiency is enhanced, and generation of particles can be suppressed.


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