Miyagi, Japan

Tatsuro Ohshita

USPTO Granted Patents = 12 

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 55(Granted Patents)


Location History:

  • Nirasaki, JP (2014 - 2016)
  • Miyagi, JP (2018 - 2023)

Company Filing History:


Years Active: 2014-2025

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12 patents (USPTO):Explore Patents

Title: Innovations of Tatsuro Ohshita

Introduction

Tatsuro Ohshita is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of engineering, particularly in the development of advanced processing apparatuses and exhaust devices. With a total of 12 patents to his name, Ohshita continues to push the boundaries of technology.

Latest Patents

Ohshita's latest patents include an innovative exhaust device and a plasma processing apparatus. The exhaust device features an exhaust mechanism that includes a first blade unit and a second blade unit, both arranged coaxially around a workpiece within a processing vessel. This design allows for efficient gas exhaust in a vacuum atmosphere. The plasma processing apparatus comprises a chamber with a substrate support that includes a bias electrode. It utilizes a plasma generator to create plasma from gas within the chamber, enhancing the processing capabilities of the apparatus.

Career Highlights

Ohshita is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work has been instrumental in developing technologies that improve manufacturing processes and efficiency. His innovative spirit and technical expertise have earned him recognition in his field.

Collaborations

Ohshita has collaborated with notable coworkers, including Kazuya Nagaseki and Shinji Himori. Their combined efforts have contributed to the advancement of various technologies within their organization.

Conclusion

Tatsuro Ohshita's contributions to innovation and technology are noteworthy. His patents reflect a commitment to improving engineering processes and enhancing the capabilities of modern technology. His work continues to inspire future advancements in the field.

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