Koshi, Japan

Shuuichi Nishikido


Average Co-Inventor Count = 3.3

ph-index = 7

Forward Citations = 110(Granted Patents)


Location History:

  • Kofu, JP (2001 - 2003)
  • Kikuyo-Machi, JP (2008)
  • Kikuchi-gun, JP (2008)
  • Koshi, JP (2010 - 2021)
  • Kumamoto, JP (2001 - 2024)

Company Filing History:


Years Active: 2001-2024

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14 patents (USPTO):Explore Patents

Title: Shuuichi Nishikido: Innovator in Substrate Processing Technologies

Introduction

Shuuichi Nishikido is a prominent inventor based in Koshi, Japan, known for his significant contributions to substrate processing technologies. With a total of 14 patents to his name, Nishikido has made remarkable advancements in methods and devices that enhance the efficiency of substrate cleaning and processing.

Latest Patents

Among his latest patents are innovative methods and devices that focus on substrate cleaning. One notable patent describes a substrate cleaning method that involves arranging a substrate within a processing container and spraying gas from a nozzle. This method generates vertical shock waves that collide with the substrate's main surface, effectively removing particles that adhere to it. Another patent outlines a substrate processing device that includes a processing container, a substrate holder, and a gas nozzle. The device is designed to control the collision of gas with the substrate, ensuring the removal of unwanted particles through the same shock wave mechanism.

Career Highlights

Shuuichi Nishikido has built a successful career at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has significantly impacted the field, particularly in improving substrate processing techniques that are crucial for the production of high-quality semiconductor devices.

Collaborations

Throughout his career, Nishikido has collaborated with notable colleagues, including Nobuo Konishi and Takayuki Toshima. These collaborations have fostered an environment of innovation and have contributed to the development of cutting-edge technologies in substrate processing.

Conclusion

Shuuichi Nishikido's contributions to substrate processing technologies exemplify his dedication to innovation in the field. His patents reflect a deep understanding of the challenges in substrate cleaning and processing, making him a key figure in advancing semiconductor manufacturing techniques.

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