The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2008
Filed:
May. 16, 2003
Tetsutoshi Awamura, Kikuchi-gun, JP;
Yukio Kiba, Kikuchi-gun, JP;
Keiichi Tanaka, Kikuchi-gun, JP;
Takahiro Okubo, Kikuchi-gun, JP;
Shuuichi Nishikido, Kikuchi-gun, JP;
Tetsutoshi Awamura, Kikuchi-gun, JP;
Yukio Kiba, Kikuchi-gun, JP;
Keiichi Tanaka, Kikuchi-gun, JP;
Takahiro Okubo, Kikuchi-gun, JP;
Shuuichi Nishikido, Kikuchi-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Rinsing nozzlestoare moved on a wafer W while they are discharging rinsing solution. At that point, discharging openingstoare contacted to developing solutioncoated on the wafer W or rinsing solutionon the wafer W. Thus, the impact against the wafer W can be suppressed. As a result, pattern collapse can be prevented. In addition, a front portion of the developing solutioncan push away the developing solution