Introduction: Shih-Chin Lien, a renowned inventor based in New Taipei, Taiwan, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 50 patents, Lien has established himself as a leading figure in the development of advanced semiconductor structures and manufacturing methods.

Latest Patents: Among Lien's latest innovations is a novel semiconductor structure and method for manufacturing it. This invention includes a substrate, a device region, a first doped region, and a gate structure. Notably, the first doped region is strategically placed adjacent to the device region, with the gate structure positioned on the first doped region, allowing for improved device performance. In another recent patent, Lien presents a semiconductor structure featuring a first doped region with a specific type of conductivity, a second doped region of opposite conductivity, and a doped strip, enhancing the functionality and efficiency of semiconductor devices.

Career Highlights: Lien currently works at Macronix International Co., Ltd., a leading company in the semiconductor industry. His work has focused on developing cutting-edge technologies that improve the performance and reliability of semiconductor devices, making a considerable impact in the electronic manufacturing sector.

Collaborations: Throughout his career, Lien has collaborated with prominent colleagues, including Cheng-Chi Lin and Shyi-Yuan Wu, to drive innovation and research in the semiconductor field. These collaborations have fostered a creative environment that enhances the development of groundbreaking technologies.

Conclusion: Shih-Chin Lien's contributions to semiconductor technology exemplify the spirit of innovation and dedication to advancing the field. His extensive patent portfolio and collaborative efforts with fellow researchers continue to influence the future of electronic devices, solidifying his reputation as a distinguished inventor in the semiconductor industry.

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