Beaverton, OR, United States of America

Robert S Chau

Average Co-Inventor Count = 5.5

ph-index = 59

Forward Citations = 12,477(Granted Patents)

Forward Citations (Not Self Cited) = 10,943(Sep 21, 2024)

DiyaCoin DiyaCoin 15.18 

Inventors with similar research interests:


Location History:

  • Aloha, OR (US) (2003)
  • Hillsboro, OR (US) (2013 - 2016)
  • Beavertown, OR (US) (2017)
  • Portland, OR (US) (2014 - 2019)
  • Beaverton, OR (US) (1993 - 2024)


Years Active: 1993-2024

where 'Filed Patents' based on already Granted Patents

495 patents (USPTO):

Title: Robert S Chau: Innovating the Future through Patents

Introduction:

Robert S Chau, a renowned inventor based in Beaverton, Oregon, has established himself as a prominent figure in the field of technology through his prolific patent portfolio. With 489 patents to his name, Chau has made significant contributions to the world of semiconductor devices and integrated circuit design. This article will delve into Chau's latest patents, career highlights, collaborations, and his overall impact on the field of innovation.

Latest Patents:

Among Chau's recent patents is the groundbreaking invention titled "Group III-N transistors for system on chip (SOC) architecture integrating power management and radio frequency circuits." This technology allows for efficient integration of radio frequency integrated circuits (RFIC) with power management integrated circuits (PMIC) within a single system on chip (SoC) architecture. By utilizing transistor technology based on group III-nitride (III-N) compounds, the architecture offers high performance and breakthrough voltage capabilities, enabling the implementation of high voltage and power circuits. It is designed for scalability and future generations of devices.

Another notable patent of Chau is the "Metallization structures for stacked device connectivity and their methods of fabrication." This invention involves a stacked device structure consisting of multiple components, such as fin structures, gates, spacers, and epitaxial structures. The unique design incorporates an insulator between two device structures, enabling improved connectivity and assembly. The metallization structure facilitates enhanced electrical connectivity between different components, resulting in more efficient and reliable device performance.

Career Highlights:

Chau's patents exemplify his remarkable career in the technology industry. He has made significant contributions to Intel Corporation, one of the world's leading semiconductor companies. During his tenure at Intel, Chau played a pivotal role in advancing the development of advanced transistor technologies for future chip designs. His work on transistor scaling and integration has helped to drive continuous performance improvements within the industry.

Collaborations:

Throughout his career, Chau has collaborated with esteemed professionals in the field of technology. Notably, he has worked closely with Jack T Kavalieros and Brian Doyle, both recognized experts in semiconductor device research and development. These collaborations have contributed to Chau's innovative approach to problem-solving and have fostered groundbreaking advancements in the realm of semiconductor devices.

Conclusion:

Robert S Chau's extensive patent portfolio and remarkable career highlight his significant contributions to the field of innovations and patents. His latest patents, including the integration of power management and radio frequency circuits in a system on chip architecture, as well as the development of metallization structures for stacked device connectivity, demonstrate his ability to push the boundaries of semiconductor technology.

Chau's collaboration with industry experts further enhances his contributions, solidifying his reputation as a visionary inventor. As technology continues to evolve, Robert S Chau's continued dedication to innovation and his extensive patent portfolio will undoubtedly have a lasting impact on the industry, inspiring future generations of inventors and shaping the technology landscape for years to come.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…