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For the Inventor, By the Inventor

Chiba, Japan

Osamu Takaoka

This inventor holds 22 USPTO granted patents and 2 published patent applications, primarily in Photomask Correction. Top assignees: Sii Nanotechnology Inc., Seiko Instruments Inc, Hitachi High-Tech Science Corporation. Active years: 2000-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Takaoka. Retrieved from https://idiyas.com/inventor/osamu-takaoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 40.9

Average Co-Inventor Count = 2.1

ph-index = 4

Forward Citations = 55(Granted Patents)


Company Filing History:

goldMedal16 out of 223 
 
Sii Nanotechnology Inc.
 patents
silverMedal5 out of 2,903 
 
Seiko Instruments Inc
 patents
bronzeMedal1 out of 225 
 
Hitachi High-Tech Science Corporation
 patents
4. 1 out of 190 
 
Shizuoka University
 patents
where one patent can have more than one assignee

Years Active: 2000-2014

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Areas of Expertise:
Photomask
Atomic Force Microscope
Micro-Machining
EUVL Mask
Electron Beam
Scanning Probe
Defect Correction
Processing Method
Dust Removal
Device
Lens
Repair
22 patents (USPTO):Explore Patents
1. 8815474 - Photomask defect correcting method and device (2014-08-26),
2. 8257887 - Photomask defect correcting method and device (2012-09-04),
3. 8062494 - Micro-machining dust removing device, micro-machining apparatus, and micro-machining dust removing method (2011-11-22),
4. 7927769 - Method for fabricating EUVL mask (2011-04-19),
5. 7804067 - Method of observing and method of working diamond stylus for working of atomic force microscope (2010-09-28),
6. 7571639 - Method of correcting opaque defect of photomask using atomic force microscope fine processing device (2009-08-11),
7. 7442925 - Working method using scanning probe (2008-10-28),
8. 7378654 - Processing probe (2008-05-27),
9. 7375352 - Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope (2008-05-20),
10. 7323685 - Ion beam processing method (2008-01-29),
11. 7285792 - Scratch repairing processing method and scanning probe microscope (SPM) used therefor (2007-10-23),
12. 7278299 - Method of processing vertical cross-section using atomic force microscope (2007-10-09),
13. 7259372 - Processing method using probe of scanning probe microscope (2007-08-21),
14. 7232995 - Method of removing particle of photomask using atomic force microscope (2007-06-19),
15. 7189655 - Method of correcting amplitude defect in multilayer film of EUVL mask (2007-03-13),

Title: Inventor Osamu Takaoka

Introduction: Osamu Takaoka is a renowned inventor based in Chiba, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Osamu Takaoka holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Osamu Takaoka has worked with leading research institutions and universities to develop cutting-edge solutions that have revolutionized the industry.

Collaborations: Throughout his career, Osamu Takaoka has collaborated with top companies and inventors worldwide, fostering a culture of innovation and knowledge sharing that has led to remarkable advancements in technology.

Conclusion: Osamu Takaoka's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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