The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2007
Filed:
May. 23, 2005
Osamu Takaoka, Chiba, JP;
Masatoshi Yasutake, Chiba, JP;
Shigeru Wakiyama, Chiba, JP;
Naoya Watanabe, Chiba, JP;
Osamu Takaoka, Chiba, JP;
Masatoshi Yasutake, Chiba, JP;
Shigeru Wakiyama, Chiba, JP;
Naoya Watanabe, Chiba, JP;
SII NanoTechnology Inc., , JP;
Abstract
An indentation is formed by thrusting a probe of a scanning probe microscope for processing, which has a vertical surface or a vertical ridge and is harder than sample material, into sample for measuring the indentation. A high-fidelity AFM observation is performed on the shape of the formed indentation with a thin probe with high aspect ratio, the direction of the vertical surface or the vertical ridge is inspected, and the angle error θ is stored. By rotating a sample stage by an angle corresponding to the measured mounting angle error θ of the probe, the mounting angle error of the probe is corrected in advance.