The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
May. 25, 2005
Osamu Takaoka, Chiba, JP;
Ryoji Hagiwara, Chiba, JP;
Osamu Takaoka, Chiba, JP;
Ryoji Hagiwara, Chiba, JP;
SII NanoTechnology Inc., , JP;
Abstract
In order to make it possible to improve throughput of AFM scratch processing, enable correction of small defects in clear defect correction with a high degree of precision, and enable correction in a shorter period of time in the event of overcutting by AFM scratch processing, throughput of AFM scratch processing is increased by maximizing high-resolution of the electron beam device and minimizing the time taken in observations using a device incorporating both an electro-optical system and an AFM head in a vacuum, correcting small clear defects with high precision by eliminating portions left over from AFM scratch processing after applying a clear defect correction film using an electron beam while providing light-blocking film raw material, and correction in a short time is made possible by eliminating portions remaining using AFM scratch processing after applying a clear defect correction film using an electron beam while providing light-blocking film raw material also in cases of overcutting in AFM scratch processing.