The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2007
Filed:
May. 23, 2005
Osamu Takaoka, Chiba, JP;
Masatoshi Yasutake, Chiba, JP;
Shigeru Wakiyama, Chiba, JP;
Naoya Watanabe, Chiba, JP;
Osamu Takaoka, Chiba, JP;
Masatoshi Yasutake, Chiba, JP;
Shigeru Wakiyama, Chiba, JP;
Naoya Watanabe, Chiba, JP;
SII NanoTechnology Inc., , JP;
Abstract
A processing method uses a probe of a scanning probe microscope. A fine marker is formed in a processing material by thrusting the probe, which is made of a material harder than the processing material, into a portion of the processing material disposed in the vicinity of an area of the processing material to be processed by the probe during a processing operation. A position of the fine marker on the processing material is detected during the processing operation. A drift amount of the area of the processing material is calculated in accordance with the detected position of the fine marker. A position of the area of the processing material is corrected in accordance with the calculated drift amount.