The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Feb. 16, 2004
Kazuo Aita, Chiba, JP;
Osamu Takaoka, Chiba, JP;
Tomokazu Kozakai, Chiba, JP;
SII Nano Technology Inc., , JP;
Abstract
When scanning by an ion beam in advance an areaincluding a reference holeformed at a position other than the area to be processedof a light-shielding filmon a glass substrate, a secondary ion signal of the same atom as the incident ions injected into the substrate is detected instead of detecting the secondary ion signal of the atoms included in the base film, and the positionof the hole is stored. Then, the areaincluding the hole formed during the processing is scanned and the secondary ion signal of the same atom as the incident ions is detected to determine the current positionof the hole, the position of the hole obtained by the previous detection and the current position of the hole are compared, and the amount of shift of the position of the hole is determined. This shifted amount is regarded as the drift amount.