Tokyo, Japan

Tomokazu Kozakai

This inventor holds 21 USPTO granted patents and 2 published patent applications, primarily in Charged Particle Beams. Top assignees: Hitachi High-Tech Science Corporation, Sii Nanotechnology Inc., Other. Active years: 2004-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomokazu Kozakai. Retrieved from https://idiyas.com/inventor/tomokazu-kozakai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 21 

% Patents Active = 47.6

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Chiba, JP (2004 - 2015)
  • Tokyo, JP (2014 - 2021)

Company Filing History:


Years Active: 2004-2021

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Areas of Expertise:
Focused Ion Beam
Charged Particle Beam
Image Acquisition
EUVL Mask
Gas Field Ion Source
Electron Microscope
Mask Repair
Ion-Electron Multi-Beam
Emitter Fabrication
Processing Method
Scanning Probe Microscope
Observation Image
21 patents (USPTO):Explore Patents

Title: **Tomokazu Kozakai: Innovator in Emitter Technology**

Introduction

Tomokazu Kozakai, based in Tokyo, Japan, is a renowned inventor with a significant portfolio of 21 patents. His innovative work primarily focuses on the fields of emitters and focused ion beam apparatuses, contributing to advancements in both manufacturing processes and imaging technologies.

Latest Patents

Kozakai's most recent patents showcase his expertise in emitter technology. One patent, titled "Method of Manufacturing Emitter," discloses a process that enables the crystal structure of the emitter's tip to regain its original state with high reproducibility. This is achieved by rearranging atoms during treatment, which helps suppress extraction voltage rise and ensures a long-lasting emitter.

Another notable patent, "Method for Acquiring Image and Ion Beam Apparatus," describes a systematic approach to acquiring images of sample regions. This method involves irradiating and scanning an ion beam in distinct patterns, generating multiple sets of image data, which are then synthesized to produce clear images for analysis.

Career Highlights

Kozakai has held important roles in prestigious companies such as Hitachi High-Tech Science Corporation and Sii Nanotechnology Inc. His contributions to these organizations have significantly impacted the development of advanced technologies in the field of emitters and ion beam applications.

Collaborations

Throughout his career, Kozakai has collaborated with esteemed colleagues, including Fumio Aramaki and Osamu Matsuda. These collaborations have fostered a rich exchange of ideas and expertise, further enhancing the innovation climate in which he works.

Conclusion

Tomokazu Kozakai's work in emitter technology and focused ion beam apparatuses represents a substantial contribution to the field of advanced manufacturing. His 21 patents reflect a commitment to innovation that continues to shape the industry. As technology evolves, Kozakai's efforts will undoubtedly influence future advancements in these critical areas.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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