The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2017
Filed:
Jan. 29, 2016
Hitachi High-tech Science Corporation, Minato-ku, Tokyo, JP;
Anto Yasaka, Tokyo, JP;
Tomokazu Kozakai, Tokyo, JP;
Osamu Matsuda, Tokyo, JP;
Yasuhiko Sugiyama, Tokyo, JP;
Kazuo Aita, Tokyo, JP;
Fumio Aramaki, Tokyo, JP;
Hiroshi Oba, Tokyo, JP;
Abstract
A focused ion beam apparatus is equipped with a gas field ion source that can produce a focused ion beam for a long period of time by stably and continuously emitting ions from the gas field ion source having high luminance, along an optical axis of an ion-optical system for a long period of time. The gas field ion source has an emitter for emitting ions, the emitter having a sharpened end part made of iridium fixed to a cylinder-shaped base part made of dissimilar wire.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile