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Yasuhiko Sugiyama

USPTO Granted Patents = 43 (Patent Applications = 4)

Average Co-Inventor Count = 2.9

ph-index = 6

Forward Citations = 135(Granted Patents)

Location History:

Chiba, JP (1999 - 2015)
Tokyo, JP (1995 - 2023)

Company Filing History:

21 out of 223

Hitachi High-tech Science Corporation

patents

12 out of 2,899

Seiko Instruments Inc

patents

8 out of 223

Sii Nanotechnology Inc.

patents

4. 2 out of 2,874

Hitachi-high-technologies Corporation

patents

Years Active: 1995-2023

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Areas of Expertise:

Focused Ion Beam Processing

Charged Particle Beam Apparatus

Plasma Ion Source

Gas Field Ion Source

Electron Microscope

Ion-Electron Multi-Beam Apparatus

Scanning Probe Microscope

Photomask Correction

Emitter Structure

Ion Beam Machining

Sample Transfer Apparatus

Film Thickness Measurement

43 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11721517 - Focused ion beam processing apparatus (2023-08-08),

2. 11276555 - Charged particle beam apparatus, composite charged particle beam apparatus, and control method for charged particle beam apparatus (2022-03-15),

3. 11257655 - Focused ion beam apparatus, and control method for focused ion beam apparatus (2022-02-22),

4. 11017988 - Charged particle beam apparatus (2021-05-25),

5. 11017982 - Composite charged particle beam apparatus and control method thereof (2021-05-25),

6. 10176964 - Focused ion beam apparatus (2019-01-08),

7. 10056232 - Charged particle beam apparatus and plasma ignition method (2018-08-21),

8. 9793085 - Focused ion beam apparatus (2017-10-17),

9. 9773646 - Plasma ion source and charged particle beam apparatus (2017-09-26),

10. 9773637 - Plasma ion source and charged particle beam apparatus (2017-09-26),

11. 9773634 - Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus (2017-09-26),

12. 9640361 - Emitter structure, gas ion source and focused ion beam system (2017-05-02),

13. 9583299 - Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus (2017-02-28),

14. 9418817 - Focused ion beam apparatus and control method thereof (2016-08-16),

15. 9378858 - Repair apparatus (2016-06-28),

Title: The Innovative Mind of Yasuhiko Sugiyama

Introduction: Yasuhiko Sugiyama is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yasuhiko Sugiyama holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Sugiyama has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant advancements in various industries.

Collaborations: Throughout his career, Yasuhiko Sugiyama has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge exchange.

Conclusion: Yasuhiko Sugiyama's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology worldwide.

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