Tokyo, Japan

Yasuhiko Sugiyama

This inventor holds 44 USPTO granted patents and 6 published patent applications, primarily in Focused Ion Beam Technology. Top assignees: Hitachi High-Tech Science Corporation, Seiko Instruments Inc, Sii Nanotechnology Inc.. Active years: 1995-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuhiko Sugiyama. Retrieved from https://idiyas.com/inventor/yasuhiko-sugiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 44 

% Patents Active = 68.2

Average Co-Inventor Count = 2.9

ph-index = 6

Forward Citations = 139(Granted Patents)


Location History:

  • Chiba, JP (1999 - 2015)
  • Tokyo, JP (1995 - 2023)

Company Filing History:


Years Active: 1995-2026

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Areas of Expertise:
Focused Ion Beam
Charged Particle Beam
Plasma Ion Source
Electron Microscope
Ion Beam Processing
Emitter Structure
Sample Transfer
Photomask Correction
Ion Beam Apparatus
Gas Field Ion Source
Mask Repair Apparatus
Composite Focused Ion Beam
44 patents (USPTO):Explore Patents

Title: The Innovative Mind of Yasuhiko Sugiyama

Introduction: Yasuhiko Sugiyama is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yasuhiko Sugiyama holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Sugiyama has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant advancements in various industries.

Collaborations: Throughout his career, Yasuhiko Sugiyama has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge exchange.

Conclusion: Yasuhiko Sugiyama's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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