The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Aug. 19, 2015
Applicant:
Hitachi High-tech Science Corporation, Minato-ku, Tokyo, JP;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); H01J 27/26 (2006.01); H01J 37/08 (2006.01); H01J 1/15 (2006.01); H01J 27/02 (2006.01); H01J 1/18 (2006.01); H01J 3/04 (2006.01);
U.S. Cl.
CPC ...
H01J 27/26 (2013.01); H01J 1/15 (2013.01); H01J 1/18 (2013.01); H01J 3/04 (2013.01); H01J 27/024 (2013.01); H01J 37/08 (2013.01); H01J 2237/002 (2013.01); H01J 2237/06316 (2013.01);
Abstract
A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.