The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2018

Filed:

Mar. 24, 2017
Applicant:

Hitachi High-tech Science Corporation, Tokyo, JP;

Inventors:

Hiroshi Oba, Tokyo, JP;

Yasuhiko Sugiyama, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); H01J 37/32 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32422 (2013.01); H01J 37/244 (2013.01); H01J 37/321 (2013.01); H01J 37/3211 (2013.01); H01J 37/3244 (2013.01); H01J 37/3299 (2013.01); H01J 37/32651 (2013.01);
Abstract

A charged particle beam apparatus according to this invention includes: a gas introduction chamber, into which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber; a coil that is wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; an electrode arranged at a boundary between the gas introduction chamber and the plasma generation chamber and having a plurality of through-holes formed therein; a plasma electrode that is provided apart from the electrode; a detection unit for detecting whether or not the plasma has been ignited in the plasma generation chamber; and a controller that controls, based on the result of detection by the detection unit, a voltage to be supplied to the plasma electrode in association with a predetermined pressure for supplying the raw gas.


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