The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Mar. 18, 2014
Applicant:

Hitachi High-tech Science Corporation, Tokyo, JP;

Inventors:

Tomokazu Kozakai, Tokyo, JP;

Fumio Aramaki, Tokyo, JP;

Osamu Matsuda, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/30 (2006.01); G01N 23/22 (2006.01); H01J 3/14 (2006.01); G01N 23/225 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01);
Abstract

A focused ion beam apparatus includes a lens interferometer configured to detect a relative position of an ion beam column and a sample. An image forming section includes an irradiation position specifying section configured to specify an irradiation position of an ion beam based on the detected relative position of the ion beam column and the sample, and a luminance setting section configured to set luminance of a pixel of an observation image based on the specified irradiation position of the ion beam and a detected amount of secondary particles.


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