The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
Oct. 18, 2012
Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) pa
Anto Yasaka, Chiba, JP;
Fumio Aramaki, Chiba, JP;
Yasuhiko Sugiyama, Chiba, JP;
Tomokazu Kozakai, Chiba, JP;
Osamu Matsuda, Chiba, JP;
Anto Yasaka, Chiba, JP;
Fumio Aramaki, Chiba, JP;
Yasuhiko Sugiyama, Chiba, JP;
Tomokazu Kozakai, Chiba, JP;
Osamu Matsuda, Chiba, JP;
Abstract
A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter, and the gas supply unit maintains the pressure in the ion source chamber in the range 1.0×10Pa to 1.0×10Pa. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.