Enter inventor name

EPO Patents = 8 (Patent Applications = 10)

Average Co-Inventor Count = 3.1

ph-index = 8

Forward Citations = 212(Granted Patents)

Location History:

Aalen, DE (2003 - 2006)
Jenna, DE (2012)
Jena, DE (2007 - 2019)

Company Filing History:

Applied Materials Israel Limited

Carl Zeiss Microscopy Gmbh

Applied Materials Isreal Ltd

patents

where one patent can have more than one assignee

Years Active: 2003-2019

Loading Chart...

19 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10504681 - Particle-optical systems and arrangements and particle-optical components for such systems and arrangements (2019-12-10),

2. 9673024 - Particle-optical systems and arrangements and particle-optical components for such systems and arrangements (2017-06-06),

3. 9224576 - Particle-optical systems and arrangements and particle-optical components for such systems and arrangements (2015-12-29),

4. 8637834 - Particle-optical systems and arrangements and particle-optical components for such systems and arrangements (2014-01-28),

5. 8268516 - Method for repairing phase shift masks (2012-09-18),

6. 8264535 - Method and apparatus for analyzing a group of photolithographic masks (2012-09-11),

7. 8097847 - Particle-optical systems and arrangements and particle-optical components for such systems and arrangements (2012-01-17),

8. 7916930 - Method and arrangement for repairing photolithography masks (2011-03-29),

9. 7554094 - Particle-optical systems and arrangements and particle-optical components for such systems and arrangements (2009-06-30),

10. 7244949 - Particle-optical systems and arrangements and particle-optical components for such systems and arrangements (2007-07-17),

11. 7135677 - Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system (2006-11-14),

12. 7015487 - Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose (2006-03-21),

13. 6967328 - Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor (2005-11-22),

14. 6946657 - Electron microscopy system (2005-09-20),

15. 6914249 - Particle-optical apparatus, electron microscopy system and electron lithography system (2005-07-05),

Title: **Innovations of Oliver Kienzle: Pioneering Particle-Optical Systems**

Introduction

Oliver Kienzle, an innovative inventor based in Jena, Germany, has made significant contributions to the field of particle optics. With a remarkable portfolio of 19 patents, he stands out for his work in developing advanced particle-optical systems and components. His inventions are paving the way for new technologies in various scientific and industrial applications.

Latest Patents

One of his latest patents pertains to particle-optical systems and arrangements, focusing on the creation and manipulation of charged-particle beams. The patent details a sophisticated arrangement that includes a charged-particle source for generating particle beams, and a multi-aperture plate that organizes these particles into beamlets. These beamlets create specific beam spots in a designated image plane, exhibiting unique patterns that enhance precision in particle manipulation. The design ensures that the regularity of the second pattern surpasses that of the first, allowing for improved electron-optical performance.

Career Highlights

Throughout his career, Kienzle has worked with leading companies in the technology sector. Notable among them are Carl Zeiss SMT AG and Applied Materials Israel Limited, where he honed his expertise in particle optics. His experiences at these prestigious firms have played a crucial role in shaping his innovations and contributions to the scientific community.

Collaborations

Kienzle's journey in innovation has also been enriched by collaborations with talented professionals in the field. Noteworthy colleagues such as Rainer K. Knippelmeyer and Stephan Uhlemann have worked alongside him, sharing insights and fostering a creative environment that enhances the development of cutting-edge technologies.

Conclusion

Oliver Kienzle's work in the realm of particle optics exemplifies the power of innovation in addressing complex scientific challenges. With numerous patents to his name and a collaborative spirit driving his research, he continues to inspire future generations of inventors in the field. As he explores new horizons in optical technology, Kienzle remains a pivotal figure in advancing our understanding and utilization of particle-based systems.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com