The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Aug. 12, 2003
Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system
Applicants:
Oliver Kienzle, Aalen, DE;
Rainer Knippelmeyer, Aalen, DE;
Stephan Uhlemann, Heidelberg, DE;
Max Haider, Gaiberg, DE;
Heiko Müller, Heidelberg, DE;
Inventors:
Oliver Kienzle, Aalen, DE;
Rainer Knippelmeyer, Aalen, DE;
Stephan Uhlemann, Heidelberg, DE;
Max Haider, Gaiberg, DE;
Heiko Müller, Heidelberg, DE;
Assignee:
Carl Zeiss NTS GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/141 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
Abstract
An electron microscopy system comprises an objective lens () which images a field displaceable in x-direction on a fixed beam axis (). The objective lens has an astigmatic effect which is compensated for by a beam shaper () on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.