The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Jul. 11, 2008
Oliver Kienzle, Jena, DE;
Rigo Richter, Zeulenroda-Triebes, DE;
Norbert Rosenkranz, Reichenbach, DE;
Yuji Kobiyama, Yokohama, JP;
Thomas Scheruebl, Jena, DE;
Oliver Kienzle, Jena, DE;
Rigo Richter, Zeulenroda-Triebes, DE;
Norbert Rosenkranz, Reichenbach, DE;
Yuji Kobiyama, Yokohama, JP;
Thomas Scheruebl, Jena, DE;
Carl Zeiss SMS GmbH, Jena, DE;
Abstract
The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated.