Campbell, CA, United States of America

Mohamed N Darwish

This inventor holds 123 USPTO granted patents and 21 published patent applications and 4 EPO patents, primarily in Power Semiconductor Devices (CPC class H01L29-7813). Top assignees: Maxpower Semiconductor Inc., Siliconix Incorporated, National Semiconductor Corporation. Active years: 1997-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mohamed N Darwish. Retrieved from https://idiyas.com/inventor/mohamed-n-darwish

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 123 

% Patents Active = 99.2

 

Average Co-Inventor Count = 2.1

ph-index = 23

Forward Citations = 2,093(Granted Patents)

Forward Citations (Not Self Cited) = 1,986(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Saratoga, CA (US) (1997 - 2003)
  • San Jose, CA (US) (2017)
  • Campbell, CA (US) (2000 - 2024)

Company Filing History:


Years Active: 1997-2025

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Areas of Expertise:
Trench Transistors
Power MOSFET
Lateral Devices
Vertical Power MOSFET
High Density Power Device
Embedded Dielectric Layers
Low-Voltage-Drop Shunt
Power Device Fabrication
Electrostatic Charge
Polysilicon-Filled Trench
Lateral Transistors
Semiconductor Structures
123 patents (USPTO):Explore Patents

Title: Mohamed N Darwish: Pioneering Innovation in Power Device Technology

Introduction:

In the realm of power device technology, Mohamed N Darwish emerges as a visionary inventor with an impressive portfolio of patents. With over a hundred patents to his name, Darwish has made significant contributions to the field. Let's take a closer look at his latest patents, notable inventions, and the companies he has been associated with throughout his career.

Innovations and Latest Patents:

One of Mohamed N Darwish's recent patents is titled "High density power device with selectively shielded recessed field plate." This patent introduces a vertical transistor structure that effectively increases the specific on-state conductance. The incorporation of a recessed field plate trench surrounding multiple adjacent gate electrodes contributes to reducing the ratio of recessed field plate area to channel area, thereby enhancing performance.

Darwish's inventive spirit further shines in his patent titled "Split gate power device and its method of fabrication." This patent describes a split gate power device featuring a U-shaped gate within a trench. By applying a bias above a threshold voltage, a conductive channel is formed in a p-well. A field plate situated beneath the gate spreads the electric field along the trench, substantially improving the breakdown voltage. This innovation allows for fabrication in conventional fabs not equipped with CMP capability, leveraging non-CMP techniques for patterning the gate.

Career and Collaborations:

Throughout his career, Mohamed N Darwish has worked with esteemed companies in the semiconductor industry. One notable organization he has been associated with is MaxPower Semiconductor Inc., where he likely had the opportunity to fuel his creativity while contributing to the development of groundbreaking power device technologies.

Darwish also collaborated with FAIRCHILD SEMICONDUCTOR CORPORATION, a prominent player in the semiconductor industry. These collaborations likely facilitated knowledge exchange and provided him with platforms to develop and refine his inventions alongside industry experts.

Besides, Darwish had the pleasure of working alongside talented coworkers such as Jun Zeng and Richard A Blanchard. Their collective expertise and collaboration might have fostered an environment of innovation and pushed the boundaries of power device technology even further.

Conclusion:

Mohamed N Darwish stands as a prolific inventor in power device technology, boasting an impressive collection of patents. His contributions to the field have propelled advancements in vertical transistor structures, high-density power devices, and the fabrication process for split gate power devices. Companies such as MaxPower Semiconductor Inc. and FAIRCHILD SEMICONDUCTOR CORPORATION have undoubtedly benefited from Darwish's inventive spirit and drive for innovation. As the industry continues to evolve, Darwish's patents and inventions will serve as a testament to his significant contributions in shaping the future of power device technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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