Company Filing History:

21 out of 10,295

Tokyo Electron Limited

patents

1 out of 164,108

International Business Machines Corporation

patents

1 out of 1,000

Central Glass Company, Limited

patents

4. 2 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 1994-2025

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23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12283489 - Etching method and etching apparatus (2025-04-21),

2. 12237173 - Substrate processing method, substrate processing apparatus and substrate processing system (2025-02-25),

3. 10903083 - Substrate processing method, substrate processing apparatus and substrate processing system (2021-01-26),

4. 10460946 - Naturally oxidized film removing method and naturally oxidized film removing device (2019-10-29),

5. 9991138 - Etching method and etching apparatus (2018-06-05),

6. 9583312 - Film formation device, substrate processing device, and film formation method (2017-02-28),

7. 9136156 - Substrate processing apparatus and film deposition apparatus (2015-09-15),

8. 9111747 - Film deposition apparatus, substrate processing apparatus and film deposition method (2015-08-18),

9. 8895456 - Method of depositing a film (2014-11-25),

10. 7592256 - Method of forming tungsten film (2009-09-22),

11. 7063871 - CVD process capable of reducing incubation time (2006-06-20),

12. 6924223 - Method of forming a metal layer using an intermittent precursor gas flow process (2005-08-02),

13. 6913996 - Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring (2005-07-05),

14. 6737666 - Apparatus and method for detecting an end point of a cleaning process (2004-05-18),

15. 6660101 - Method and apparatus for cleaning film deposition device (2003-12-09),

Title: Mitsuhiro Tachibana: A Leader in Substrate Processing Innovations

Introduction

Mitsuhiro Tachibana, an accomplished inventor based in Nirasaki, Japan, has made noteworthy contributions to the field of substrate processing. With a remarkable portfolio comprising 22 patents, Tachibana's work focuses on advancing technology to enhance substrate treatment methods.

Latest Patents

Two of Mitsuhiro Tachibana's latest patents are centered around a substrate processing method, substrate processing apparatus, and substrate processing system. These patents introduce an innovative substrate processing method that involves treating a substrate with a fluorine-containing gas, followed by exposure to a moisture-containing atmosphere. This technological advancement aims to improve substrate processing efficiency and effectiveness in various applications.

Career Highlights

Throughout his career, Mitsuhiro Tachibana has worked with notable companies, most prominently Tokyo Electron Limited, where he has played a key role in developing cutting-edge processing technologies. His expertise and experience have significantly contributed to advancements in the electronics manufacturing domain.

Collaborations

Tachibana has collaborated with talented individuals in the field, including colleagues like Hideaki Yamasaki and Yumiko Kawano. These partnerships have fostered innovation and have been instrumental in the successful development of new technologies related to substrate processing.

Conclusion

Mitsuhiro Tachibana stands out as a pioneering inventor in the realm of substrate processing, with his extensive patent portfolio reflecting his commitment to innovation. His latest patents not only highlight his technical expertise but also his dedication to advancing technology that can greatly impact various industries. As the field continues to evolve, Tachibana's contributions are likely to play a crucial role in shaping the future of substrate processing.

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