The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
Jul. 14, 2003
Hideaki Yamasaki, Nirasaki, JP;
Tatsuo Hatano, Nirasaki, JP;
Tsukasa Matsuda, Nirasaki, JP;
Taro Ikeda, Nirasaki, JP;
Kazuhito Nakamura, Nirasaki, JP;
Koumei Matsuzawa, Nirasaki, JP;
Yumiko Kawano, Nirasaki, JP;
Mitsuhiro Tachibana, Nirasaki, JP;
Hideaki Yamasaki, Nirasaki, JP;
Tatsuo Hatano, Nirasaki, JP;
Tsukasa Matsuda, Nirasaki, JP;
Taro Ikeda, Nirasaki, JP;
Kazuhito Nakamura, Nirasaki, JP;
Koumei Matsuzawa, Nirasaki, JP;
Yumiko Kawano, Nirasaki, JP;
Mitsuhiro Tachibana, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A metal CVD process includes a step (A) of introducing a gaseous source material containing a metal carbonyl compound into a process space adjacent to a surface of a substrate to be processed in such a manner that the metal carbonyl compound has a first partial pressure, and a step (B) of depositing a metal film on the surface of the substrate by introducing a gaseous source material containing the metal carbonyl compound into the process space in such a mater that the metal carbonyl compound has a second, smaller partial pressure. The step (A) is conducted such that there is caused no substantial deposition of the metal film on the substrate.