The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2005

Filed:

Nov. 13, 2001
Applicants:

Hideaki Yamasaki, Nirasaki, JP;

Mitsuhiro Tachibana, Nirasaki, JP;

Kazuya Okubo, Nirasaki, JP;

Kenji Suzuki, Nirasaki, JP;

Yumiko Kawano, Nirasaki, JP;

Inventors:

Hideaki Yamasaki, Nirasaki, JP;

Mitsuhiro Tachibana, Nirasaki, JP;

Kazuya Okubo, Nirasaki, JP;

Kenji Suzuki, Nirasaki, JP;

Yumiko Kawano, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/4763 ; H01L021/44 ;
U.S. Cl.
CPC ...
Abstract

A metal film forming method, includes the steps of (a) (s, s) supplying a plural kinds of ingredient gases to a base barrier film () in sequence, wherein at least one of the gases includes a metal, and (b) (s, s) vacuum-exhausting the ingredient gases of the step (a) or substituting the ingredient gases of the step (a) by an other kind of gas after the ingredient gases of the step (a) are supplied respectively, thereby an extremely thin film () of the metal is formed on the base barrier film ().


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