Fujisawa, Japan

Mitsuhiko Shirakashi

This inventor holds 25 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Electrochemical Processing. Top assignees: Ebara Corporation, Kabushiki Kaisha Toshiba, Nihon Micro Coating Co., Ltd.. Active years: 2001-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuhiko Shirakashi. Retrieved from https://idiyas.com/inventor/mitsuhiko-shirakashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 72.0


Average Co-Inventor Count = 6.0

ph-index = 8

Forward Citations = 158(Granted Patents)


Location History:

  • Fujiswawa, JP (2004)
  • Kanagawa, JP (2004)
  • Kanagawa-ken, JP (2002 - 2005)
  • Fujisawa, JP (2001 - 2007)
  • Ohta-ku, JP (2009)
  • Tokyo, JP (2001 - 2016)

Company Filing History:


Years Active: 2001-2016

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Areas of Expertise:
Electrochemical Machining
Substrate Processing
Semiconductor Polishing
Ion Exchanger Regeneration
Electrolytic Processing
Cleaning Apparatus
Polishing Method
Electrolytic Machining
25 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Mitsuhiko Shirakashi

Introduction

Mitsuhiko Shirakashi, a notable inventor based in Fujisawa, Japan, has made significant contributions to the field of substrate processing and ion exchange technology. With a remarkable portfolio of 25 patents, his work exemplifies innovation and the constant pursuit of efficiency in various processes.

Latest Patents

Among his latest inventions is a substrate processing apparatus, designed to enhance the polishing process. This apparatus comprises first and second polishing units for refining the peripheral portion of a substrate. It integrates a primary cleaning unit, a secondary cleaning and drying unit, and a measurement unit, ensuring precise measurements needed for effective polishing. The measurement unit is equipped with various mechanisms for determining parameters such as diameter, cross-sectional shape, and surface condition.

Another significant patent is the method for regenerating an ion exchanger, which addresses the challenges associated with the cleaning and disposal of ion exchangers. This innovative method employs a regeneration electrode and a counter electrode to achieve regeneration efficiently. By applying voltage and supplying liquids appropriately, this technique minimizes the environmental impact associated with waste liquid disposal.

Career Highlights

Mitsuhiko has had a distinguished career, contributing his expertise at Ebara Corporation, where he was involved in pioneering various technologies. His innovative approach has not only propelled his career but has also contributed to the advancements in the industries he has worked in.

Collaborations

Throughout his career, Mitsuhiko Shirakashi has collaborated with talented professionals, including Itsuki Kobata and Takayuki Saito. These partnerships highlight the collaborative spirit integral to driving innovation and developing groundbreaking solutions in technology.

Conclusion

Mitsuhiko Shirakashi's impressive array of patents and his commitment to innovation mark him as a key figure in the development of advanced technologies in substrate processing and ion exchange. His work continues to influence various industries, paving the way for more efficient and environmentally friendly processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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