The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
Apr. 18, 2006
Tamami Takahashi, Tokyo, JP;
Mitsuhiko Shirakashi, Tokyo, JP;
Kenya Ito, Tokyo, JP;
Kazuyuki Inoue, Tokyo, JP;
Kenji Yamaguchi, Tokyo, JP;
Masaya Seki, Tokyo, JP;
Tamami Takahashi, Tokyo, JP;
Mitsuhiko Shirakashi, Tokyo, JP;
Kenya Ito, Tokyo, JP;
Kazuyuki Inoue, Tokyo, JP;
Kenji Yamaguchi, Tokyo, JP;
Masaya Seki, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
A substrate processing apparatus includes first and second polishing units for polishing a peripheral portion of a substrate, a primary cleaning unit for cleaning the substrate, a secondary cleaning and drying unit for drying the substrate cleaned in the primary cleaning unit, and a measurement unit for measuring the peripheral portion of the substrate. The measurement unit includes a mechanism for measurement required for polishing in the first and second polishing units, such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.