The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Sep. 04, 2002
Takayuki Saito, Fujisawa, JP;
Tsukuru Suzuki, Fujisawa, JP;
Yuji Makita, Fujisawa, JP;
Kaoru Yamada, Fujisawa, JP;
Mitsuhiko Shirakashi, Tokyo, JP;
Kenya Ito, Tokyo, JP;
Takayuki Saito, Fujisawa, JP;
Tsukuru Suzuki, Fujisawa, JP;
Yuji Makita, Fujisawa, JP;
Kaoru Yamada, Fujisawa, JP;
Mitsuhiko Shirakashi, Tokyo, JP;
Kenya Ito, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A substrate processing apparatus comprises roll chucks for holding and rotating a substrate, a closable chamber housing the roll chucks therein, and a gas introduction pipe for introducing a gas into the chamber. The substrate processing apparatus further comprises an etching unit for etching and cleaning a peripheral portion of the substrate while the substrate is being rotated by the roll chucks, and a first supply passage for supplying a first liquid to the etching unit.