The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Jan. 31, 2003
Mitsuhiko Shirakashi, Tokyo, JP;
Masayuki Kumekawa, Tokyo, JP;
Hozumi Yasuda, Tokyo, JP;
Itsuki Kobata, Tokyo, JP;
Osamu Nabeya, Tokyo, JP;
Mitsuhiko Shirakashi, Tokyo, JP;
Masayuki Kumekawa, Tokyo, JP;
Hozumi Yasuda, Tokyo, JP;
Itsuki Kobata, Tokyo, JP;
Osamu Nabeya, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
This invention relates to an electrolytic processing apparatus and method useful for processing a conductive material formed in the surface of a substrate, or for removing impurities adhering to the surface of a substrate. An electrolytic processing apparatus, including, a processing electrode that can come close to a workpiece, a feeding electrode for feeding electricity to the workpiece, an ion exchanger disposed in the space between the workpiece and the processing and the feeding electrodes, a fluid supply section for supplying a fluid between the workpiece and the ion exchanger, and a power source. The processing electrode and/or the feeding electrode is electrically divided into a plurality of parts, and the power source applies a voltage to each of the divided electrode parts and can control voltage and/or electric current independently for each of the divided electrode parts.