The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Jan. 07, 2003
Itsuki Kobata, Tokyo, JP;
Mitsuhiko Shirakashi, Tokyo, JP;
Masayuki Kumekawa, Tokyo, JP;
Takayuki Saito, Fujisawa, JP;
Yasushi Toma, Fujisawa, JP;
Tsukuru Suzuki, Fujisawa, JP;
Kaoru Yamada, Fujisawa, JP;
Yuji Makita, Fujisawa, JP;
Hozumi Yasuda, Tokyo, JP;
Itsuki Kobata, Tokyo, JP;
Mitsuhiko Shirakashi, Tokyo, JP;
Masayuki Kumekawa, Tokyo, JP;
Takayuki Saito, Fujisawa, JP;
Yasushi Toma, Fujisawa, JP;
Tsukuru Suzuki, Fujisawa, JP;
Kaoru Yamada, Fujisawa, JP;
Yuji Makita, Fujisawa, JP;
Hozumi Yasuda, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
There is provided an electrolytic processing device including: a processing electrode to be brought into contact with or close to a workpiece; a feeding electrode for supplying electricity to the workpiece; an ion exchanger disposed in at least one of spaces between the workpiece and the processing electrode, and between the workpiece and the feeding electrode; a power source for applying a voltage between the processing electrode and the feeding electrode; and a liquid supply section for supplying a liquid to the space between the workpiece and at least one of the processing electrode and the feeding electrode, in which the ion exchanger is present. A substrate processing apparatus having the electrolytic processing device is also provided.