The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2009

Filed:

Sep. 25, 2003
Applicants:

Osamu Nabeya, Ohta-ku, JP;

Masayuki Kumekawa, Ohta-ku, JP;

Hozumi Yasuda, Ohta-ku, JP;

Itsuki Kobata, Ohta-ku, JP;

Takeshi Iizumi, Ohta-ku, JP;

Nobuyuki Takada, Ohta-ku, JP;

Koichi Fukaya, Ohta-ku, JP;

Mitsuhiko Shirakashi, Ohta-ku, JP;

Takayuki Saito, Fujisawa, JP;

Yasushi Toma, Fujisawa, JP;

Tsukuru Suzuki, Fujisawa, JP;

Kaoru Yamada, Fujisawa, JP;

Yuji Makita, Fujisawa, JP;

Inventors:

Osamu Nabeya, Ohta-ku, JP;

Masayuki Kumekawa, Ohta-ku, JP;

Hozumi Yasuda, Ohta-ku, JP;

Itsuki Kobata, Ohta-ku, JP;

Takeshi Iizumi, Ohta-ku, JP;

Nobuyuki Takada, Ohta-ku, JP;

Koichi Fukaya, Ohta-ku, JP;

Mitsuhiko Shirakashi, Ohta-ku, JP;

Takayuki Saito, Fujisawa, JP;

Yasushi Toma, Fujisawa, JP;

Tsukuru Suzuki, Fujisawa, JP;

Kaoru Yamada, Fujisawa, JP;

Yuji Makita, Fujisawa, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 7/00 (2006.01); B23H 5/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrolytic processing apparatus which, while eliminating a CMP processing entirely or reducing a load on a CMP processing to the least possible extent, can process and flatten a conductive material formed in the surface of a substrate, or can remove (clean) extraneous matter adhering to the surface of a workpiece such as a substrate. The present invention includes an electrode section including a plurality of electrode members disposed in parallel, each electrode member including an electrode and an ion exchanger covering the surface of the electrode, a holder for holding a workpiece, which is capable of bringing the workpiece close to or into contact with the ion exchanger of the electrode member, and a power source to be connected to the electrode of each electrode member of the electrode section. The ion exchanger of the electrode member includes an ion exchanger having an excellent surface smoothness and an ion exchanger having a large ion exchange capacity.


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