Tokyo, Japan

Koichi Fukaya

USPTO Granted Patents = 17 

Average Co-Inventor Count = 4.7

ph-index = 6

Forward Citations = 101(Granted Patents)


Location History:

  • Ohta-ku, JP (2009)
  • Tokyo, JP (2006 - 2024)

Company Filing History:


Years Active: 2006-2025

Loading Chart...
17 patents (USPTO):

Title: Koichi Fukaya: Innovator in Substrate Cleaning Technologies

Introduction

Koichi Fukaya is a prominent inventor based in Tokyo, Japan, known for his significant contributions to substrate cleaning technologies. With a total of 17 patents to his name, Fukaya has made remarkable advancements in the field, particularly in the development of cleaning apparatuses and methods.

Latest Patents

Fukaya's latest patents include a substrate cleaning apparatus and a substrate cleaning method. The substrate cleaning apparatus features a substrate rotation supporting section that supports and rotates a substrate. It also includes a roll holding section that rotatably holds two roll cleaning members, each having a length almost equal to the radius of the substrate. The apparatus is designed to ensure that the cleaning members are in sliding contact with different radial parts of the substrate's front surface. Additionally, his substrate cleaning system incorporates a heater, a chemical-liquid diluting module, and a cleaning module. This system is engineered to scrub the substrate with a diluted chemical liquid at a temperature that is higher than normal but lower than the glass transition point of the cleaning member.

Career Highlights

Fukaya has had a distinguished career at Ebara Corporation, where he has been instrumental in developing innovative cleaning solutions. His work has not only advanced the technology but has also contributed to the efficiency and effectiveness of substrate cleaning processes in various applications.

Collaborations

Throughout his career, Fukaya has collaborated with notable colleagues, including Tetsuji Togawa and Osamu Nabeya. These collaborations have fostered a creative environment that has led to the successful development of several patented technologies.

Conclusion

Koichi Fukaya's contributions to substrate cleaning technologies have established him as a leading inventor in his field. His innovative patents and collaborative efforts continue to influence the industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…