The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2025

Filed:

Nov. 25, 2020
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Hiroki Takahashi, Tokyo, JP;

Kohei Sato, Tokyo, JP;

Koichi Fukaya, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 1/10 (2024.01); B08B 1/20 (2024.01); B08B 3/02 (2006.01); B08B 3/08 (2006.01); B08B 3/14 (2006.01); B08B 13/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 3/08 (2013.01); B08B 1/10 (2024.01); B08B 1/20 (2024.01); B08B 3/022 (2013.01); B08B 3/14 (2013.01); B08B 13/00 (2013.01); H01L 21/02057 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01); B08B 2203/007 (2013.01);
Abstract

The present invention relates to a substrate cleaning system and a substrate cleaning method for cleaning a substrate. The substrate cleaning system () includes a heater (), a chemical-liquid diluting module (), and a cleaning module. A temperature of the diluted-chemical-liquid mixed by the chemical-liquid diluting module () is determined to be higher than normal a temperature and lower than a glass transition point of a cleaning member. The cleaning member scrubs the substrate (W) with the diluted chemical liquid having the determined temperature supplied to the substrate (W).


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