This inventor holds 57 USPTO granted patents and 29 published patent applications and 6 EPO patents, primarily in Plasma Processing. Top assignees: Hitachi-High-Technologies Corporation, Hitachi High-Tech Corporation, Canon Kabushiki Kaisha. Active years: 1987-2026.
Location History:
- Tainai, JP (2010)
- Kudamatsu, JP (2012 - 2016)
- Kanagawa, JP (2022)
- Yokohama, JP (2020 - 2023)
- Tokyo, JP (1987 - 2024)
Company Filing History:
14 out of 2,874Â 
12 out of 1,367Â 
10 out of 92,799Â 
Years Active: 1987-2026
Areas of Expertise:
Title: Innovator Spotlight: Kohei Sato
Introduction: Kohei Sato, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of substrate cleaning technologies. With an impressive portfolio of 35 patents, Sato has established himself as a key player in innovation. His inventions primarily focus on enhancing efficiency and effectiveness in substrate processing.
Latest Patents: Among his latest patents are a substrate cleaning system and a substrate cleaning method, which aim to optimize the cleaning process of various substrates. This cleaning system incorporates a heater, a chemical-liquid diluting module, and a cleaning module. The invention ensures that the temperature of the diluted chemical liquid remains higher than normal but lower than the glass transition point of the cleaning member. Consequently, the cleaning member effectively scrubs substrates using the specially conditioned chemical liquid. Another notable patent is the plasma treatment apparatus, which features a treatment chamber and a gas supply device. This device is designed to hermetically seal gas joints while maintaining communication within the system, thereby improving the treatment gas supply.
Career Highlights: Sato's career has been marked by his tenure at leading companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His work in these organizations has allowed him to develop innovative solutions that address complex substrate cleaning challenges.
Collaborations: Throughout his career, Sato has collaborated with talented colleagues, including Kazunori Nakamoto and Takamasa Ichino. Their joint efforts have contributed to the successful development and implementation of advanced substrate cleaning technologies.
Conclusion: Kohei Sato's innovations in substrate cleaning systems and methods stand testament to his expertise and dedication to advancing technology. His extensive patent portfolio highlights his significant contribution to the field, and his collaborations continue to inspire future innovations in substrate processing.