The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Jun. 21, 2021
Hitachi High-tech Corporation, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
Provided is a plasma processing apparatus having high safety whose running cost is reduced. The plasma processing apparatus includes: a vacuum container; a processing chamber disposed inside the vacuum container; and a processing gas line through which a processing gas is supplied into the processing chamber to form plasma in the processing chamber, in which the processing unit includes a plurality of pipes through which a plurality of types of gases flow respectively every type of gas, and a box body surrounding the pipes, and air whose temperature is adjusted to a predetermined range is supplied to the box body.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile