Tokyo, Japan

Yusuke Takao

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yusuke Takao. Retrieved from https://idiyas.com/inventor/yusuke-takao-ap6fc3z3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yusuke Takao: Innovator in Plasma Processing Technology

Introduction

Yusuke Takao is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work focuses on enhancing safety and reducing operational costs in plasma processing apparatuses.

Latest Patents

Yusuke Takao holds a patent for a plasma processing apparatus. This apparatus is designed to provide high safety while minimizing running costs. The invention includes a vacuum container and a processing chamber located within it. Additionally, it features a processing gas line that supplies gas into the chamber to form plasma. The processing unit consists of multiple pipes for different types of gases, all enclosed in a box body. Air, with its temperature adjusted to a predetermined range, is supplied to this box body, ensuring optimal performance.

Career Highlights

Yusuke Takao is associated with Hitachi High-Tech Corporation, where he continues to develop advanced technologies. His work has been instrumental in improving the efficiency and safety of plasma processing systems.

Collaborations

He collaborates with talented coworkers, including Ryoichi Isomura and Kohei Sato, who contribute to the innovative projects at Hitachi High-Tech Corporation.

Conclusion

Yusuke Takao's contributions to plasma processing technology exemplify his commitment to innovation and safety. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to improving industrial processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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