Hitachi High-Tech Corporation

Yusuke Takao

Kohei Sato

Ryoichi Isomura

Provided is a plasma processing apparatus having high safety whose running cost is reduced. The plasma processing apparatus includes: a vacuum container; a processing chamber disposed inside the vacuum container; and a processing gas line through which a processing gas is supplied into the processing chamber to form plasma in the processing chamber, in which the processing unit includes a plurality of pipes through which a plurality of types of gases flow respectively every type of gas, and a box body surrounding the pipes, and air whose temperature is adjusted to a predetermined range is supplied to the box body.

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Tokyo, Japan

Yusuke Takao