The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2024
Filed:
May. 27, 2021
Hitachi High-tech Corporation, Tokyo, JP;
Kentaro Kiyosue, Tokyo, JP;
Kohei Sato, Tokyo, JP;
Ryoichi Isomura, Tokyo, JP;
Koji Nagai, Tokyo, JP;
Tsutomu Matsuyoshi, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
A plasma treatment apparatus includes a treatment chamberand a gas supply devicefor supplying a treatment gas into the treatment chamber. The gas supply deviceincludes: a mass flow controller boxhaving an intake portand an exhaust port; a plurality of pipesto each of which a mass flow controller () is attached; and a plurality of pipeswhich are connected to the pipesin the mass flow controller boxand connected to a plurality of pipesas supply sources of the treatment gas by a plurality of jointsoutside the mass flow controller box. At least one of the jointsis covered by a pipe coverso that the jointis hermetically sealed. The inside of the pipe coverand the inside of the mass flow controller boxare communicated by a communicating member (circumferential pipe, tube).