The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Jun. 26, 2017
Applicant:
Ebara Corporation;
Inventors:
Shinji Kajita, Tokyo, JP;
Hisajiro Nakano, Tokyo, JP;
Tomoatsu Ishibashi, Tokyo, JP;
Koichi Fukaya, Tokyo, JP;
Yasuyuki Motoshima, Tokyo, JP;
Yohei Eto, Tokyo, JP;
Fumitoshi Oikawa, Tokyo, JP;
Assignee:
EBARA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/304 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/304 (2013.01); H01L 21/02041 (2013.01); H01L 21/6708 (2013.01); H01L 21/6715 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/68714 (2013.01); H01L 21/68728 (2013.01);
Abstract
An apparatus for cleaning a substrate has a holding unitthat holds a substrate W; a rotated unitconnected to the holding unit; a rotating unitthat is provided on a peripheral outer side of the rotated unitand rotates the rotated unit; and a cleaning unitthat physically cleans the substrate W held by the holding unit