logo

For the Inventor, By the Inventor

Tokyo, Japan

Hisajiro Nakano

USPTO Granted Patents = 13 

Average Co-Inventor Count = 2.5

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:

goldMedal13 out of 2,512 
 
Ebara Corporation
 patents

Years Active: 2016-2024

Loading Chart...
13 patents (USPTO):Explore Patents
1. 11948827 - Substrate support mechanism, substrate cleaning device and substrate processing method (2024-04-02),
2. 11664252 - Cleaning device, polishing device, and device and method for calculating rotation speed of substrate in cleaning device (2023-05-30),
3. 11626299 - Cover for swing member of substrate processing apparatus, swing member of substrate processing apparatus, and substrate processing apparatus (2023-04-11),
4. 11532491 - Substrate cleaning apparatus, substrate processing apparatus, and method of cleaning substrate (2022-12-20),
5. 11495475 - Method of cleaning a substrate (2022-11-08),
6. 11311918 - Substrate cleaning apparatus and substrate cleaning method (2022-04-26),
7. 11180303 - Storage container of scrubbing member and package of same (2021-11-23),
8. 11094548 - Apparatus for cleaning substrate and substrate cleaning method (2021-08-17),
9. 10991602 - Substrate washing device (2021-04-27),
10. 10741423 - Substrate cleaning apparatus, substrate processing apparatus, and method of cleaning substrate (2020-08-11),
11. 10361101 - Substrate cleaning apparatus and substrate processing apparatus X (2019-07-23),
12. 10096492 - Substrate cleaning apparatus and polishing apparatus (2018-10-09),
13. 9472441 - Substrate processing apparatus (2016-10-18),

Title: Hisajiro Nakano: A Pioneer in Substrate Cleaning Innovations

Introduction

Hisajiro Nakano, based in Tokyo, Japan, is a distinguished inventor known for his contributions to substrate processing technologies. With a remarkable portfolio of 13 patents, his innovations have significantly advanced the field of substrate cleaning and processing.

Latest Patents

His latest patents include innovative solutions such as the substrate support mechanism, substrate cleaning device, and substrate processing method. The substrate support mechanism features a swingable first support part that contacts the peripheral edge of one side of a substrate, along with a second support part that supports the opposite side. This design aims to suppress wear on cleaning members and minimize unintended dust generation.

Additionally, Nakano's cleaning device incorporates multiple rollers that hold the substrate's peripheral edge while a rotation driving unit rotates it. The device also includes a cleaning member that cleans the substrate, a cleaning liquid supply nozzle, and a sound-detection microphone that informs the calculation of the substrate's rotation speed based on the sounds generated during use.

Career Highlights

Throughout his career at Ebara Corporation, Nakano has demonstrated exceptional creativity and technical expertise in substrate cleaning solutions. His work has played a critical role in the development of efficient and reliable devices that enhance the performance and longevity of substrates used in various applications.

Collaborations

Nakano collaborates with other talented professionals, including Junji Kunisawa and Tomoatsu Ishibashi, which fosters an environment of innovation and excellence. Together, those engineers consistently push the boundaries of technology, delivering solutions that address complex industry challenges.

Conclusion

Hisajiro Nakano's impactful contributions to substrate processing technology through his numerous patents underline his status as a leading inventor in his field. His dedication to innovation continues to inspire advancements in substrate cleaning and processing, shaping the future of this critical industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…