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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11664252 B1

PDFFull Text
Date of Patent:
May. 30, 2023

Filed:

Dec. 21, 2020

Cleaning device, polishing device, and device and method for calculating rotation speed of substrate in cleaning device

Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Michiaki Matsuda, Tokyo, JP;

Hisajiro Nakano, Tokyo, JP;

Fuyuki Ogaki, Tokyo, JP;

Yusuke Watanabe, Tokyo, JP;

Junji Kunisawa, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:

BakerHostetler

Primary Examiner:

Shay Karls

Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 1/00 (2006.01); B08B 1/02 (2006.01); B08B 3/02 (2006.01); B08B 13/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); B08B 1/001 (2013.01); B08B 1/02 (2013.01); B08B 3/022 (2013.01); B08B 13/00 (2013.01); H01L 21/67051 (2013.01); H01L 21/67219 (2013.01); H01L 21/67288 (2013.01); H01L 21/02057 (2013.01);
Abstract

A cleaning device includes: a plurality of rollers that hold a peripheral edge part of a substrate; a rotation driving unit that rotates the substrate by rotationally driving the plurality of rollers; a cleaning member that abuts on the substrate and cleans the substrate; a cleaning liquid supply nozzle that supplies a cleaning liquid to the substrate; a microphone that detects a sound generated when a notch of the peripheral edge part of the substrate hits the plurality of rollers; and a rotation speed calculation unit that calculates a rotation speed of the substrate on the basis of the sound detected by the microphone.

Find Patent Forward Citations

Matsuda, Michiaki. (2023). Cleaning device, polishing device, and device and method for calculating rotation speed of substrate in cleaning device (U.S. Patent No. 11664252). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11664252

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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