The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2024
Filed:
Jun. 12, 2022
Applicant:
Ebara Corporation, Tokyo, JP;
Inventors:
Assignee:
EBARA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); B08B 3/02 (2006.01); B08B 13/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68728 (2013.01); B08B 3/022 (2013.01); B08B 13/00 (2013.01); H01L 21/67028 (2013.01);
Abstract
The disclosure provides one technique for suppressing wear of a cleaning member and unexpected dust generation. A substrate support mechanismincludes a first support partwhich is swingable and has a contact region that can come into contact with a peripheral edge of one surface of a substrate W in a closed state, a second support partwhich supports the other surface of the substrate W, and a first support part moving partwhich swings the first support part
Miyazaki, Mitsuru. (2024). Substrate support mechanism, substrate cleaning device and substrate processing method (U.S. Patent No. 11948827). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11948827
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile