Tokyo, Japan

Takuya Inoue

This inventor holds 27 USPTO granted patents and 7 published patent applications and 2 EPO patents, primarily in Substrate Processing Technology. Top assignees: Ebara Corporation, Mitsubishi Electric Corporation, Sumitomo Chemical Company, Limited. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takuya Inoue. Retrieved from https://idiyas.com/inventor/takuya-inoue-g66ze86t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27 

% Patents Active = 81.5

 

Average Co-Inventor Count = 2.6

ph-index = 4

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2011-2026

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Areas of Expertise:
Capacitive Button
Input Device
Substrate Processing Apparatus
Substrate Cleaning Device
Cleaning Apparatus
Polishing Apparatus
Substrate Support Mechanism
Transport Apparatus
Cleaning Liquid Supplying System
Roller Shaft
Pest Control Composition
Plant Disease Control Composition
27 patents (USPTO):Explore Patents

Title: Takuya Inoue: Innovator in Cleaning and Substrate Supporting Technologies

Introduction

Takuya Inoue is an accomplished inventor based in Tokyo, Japan, known for his significant contributions to the field of cleaning and substrate supporting technologies. With a prolific portfolio of 21 patents, he has made a profound impact on various industries through his innovative designs and methods.

Latest Patents

Among his latest innovations are two notable patents. The first is a **cleaning apparatus** that features a cleaning tank designed for cleaning wafers, including a wafer rotation mechanism, a cleaning member, and a swing mechanism to enhance the cleaning process. This apparatus ensures a thorough clean by allowing the cleaning member to swivel into a position directly above the wafer.

The second patent is for a **substrate supporting apparatus** which provides a method for effectively attaching and detaching substrates. This invention includes multiple supporting members that rotate the substrate and a driving device that facilitates the movement of driven members to ensure precise control of the substrate.

Career Highlights

Inoue has made remarkable strides in his career through his work with prominent companies. He has been associated with **Ebara Corporation** and **Sumitomo Chemical Company, Limited**, where he has contributed to advancing technologies related to his field.

Collaborations

Throughout his career, Inoue has collaborated with notable professionals including Mitsuru Miyazaki and Naoki Toyomura. These collaborations have allowed him to broaden his innovative scope and enhance his contributions to the industry.

Conclusion

Takuya Inoue’s inventive spirit and commitment to advancing technology in cleaning and substrate supporting mechanisms have positioned him as a key figure in his field. His 21 patents reflect his dedication to innovation and his ability to address complex challenges within precision technology sectors. As technology continues to evolve, Inoue's work remains integral to developing more efficient solutions in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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