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For the Inventor, By the Inventor

Tokyo, Japan

Tomoatsu Ishibashi

This inventor holds 54 USPTO granted patents and 10 published patent applications and 2 EPO patents, primarily in Substrate Cleaning Technology (CPC class H01L). Top assignee: Ebara Corporation. Active years: 2014-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomoatsu Ishibashi. Retrieved from https://idiyas.com/inventor/tomoatsu-ishibashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 54 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.2

ph-index = 7

Forward Citations = 143(Granted Patents)

Forward Citations (Not Self Cited) = 121(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal54 out of 2,576 
 
Ebara Corporation
 patents

Years Active: 2014-2025

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Areas of Expertise:
Substrate Cleaning
Substrate Drying
Cleaning Apparatus
Polishing Apparatus
Washing Device
Processing Apparatus
Cleaning Methods
Scrubbing Member
Roll-Type Processing
Pencil-Type Processing
Jig for Cleaning
Storage Container
54 patents (USPTO):Explore Patents
1. 12485516 - Substrate cleaning apparatus, polishing apparatus, buffing apparatus, substrate cleaning method, substrate processing apparatus, and machine learning apparatus (2025-12-02),
2. 12394639 - Substrate drying device and substrate drying method (2025-08-19),
3. 12033847 - Cleaning module, substrate processing apparatus including cleaning module, and cleaning method (2024-07-09),
4. 11837477 - Washing device and washing method (2023-12-05),
5. 11817311 - Substrate cleaning method and substrate cleaning apparatus (2023-11-14),
6. 11676827 - Substrate cleaning apparatus, substrate cleaning method, substrate processing apparatus, and substrate drying apparatus (2023-06-13),
7. 11660643 - Substrate cleaning device and substrate cleaning method (2023-05-30),
8. 11642704 - Roll-type processing member, pencil-type processing member, and substrate processing apparatus including any one of these (2023-05-09),
9. 11626299 - Cover for swing member of substrate processing apparatus, swing member of substrate processing apparatus, and substrate processing apparatus (2023-04-11),
10. 11524322 - Jig for attaching and detaching cleaning member (2022-12-13),
11. 11501983 - Substrate cleaning member and substrate cleaning apparatus (2022-11-15),
12. 11424138 - Substrate cleaning tool, substrate cleaning apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate cleaning tool (2022-08-23),
13. 11180303 - Storage container of scrubbing member and package of same (2021-11-23),
14. 11164758 - Washing device and washing method (2021-11-02),
15. 11094548 - Apparatus for cleaning substrate and substrate cleaning method (2021-08-17),

Title: Tomoatsu Ishibashi: Innovating Substrate Cleaning Technologies

Introduction: Tomoatsu Ishibashi is an esteemed inventor based in Tokyo, Japan, renowned for his remarkable contributions to the field of substrate cleaning technologies. With an impressive portfolio of 51 patents, Ishibashi continues to revolutionize the industry with his innovative approaches.

Latest Patents: Ishibashi's latest patents include a cutting-edge washing device and washing method aimed at enhancing the efficiency and effectiveness of substrate cleaning processes. The inventions feature advanced techniques such as roll washing members, single tube nozzles, and spray nozzles, all designed to optimize cleaning procedures for various substrates.

Career Highlights: Throughout his career at Ebara Corporation, Ishibashi has been instrumental in developing groundbreaking solutions for substrate cleaning. His dedication to research and development has led to the successful implementation of novel technologies that have significantly improved cleaning efficiency in manufacturing processes.

Collaborations: Ishibashi has had the privilege of collaborating with talented individuals in his field, including Koichi Fukaya and Hisajiro Nakano. Together, they have combined their expertise to push the boundaries of substrate cleaning technologies, fostering a culture of innovation and collaboration within the industry.

Conclusion: Tomoatsu Ishibashi's relentless pursuit of excellence and his passion for innovation have established him as a pioneer in the field of substrate cleaning technologies. His patents and contributions continue to inspire the next generation of inventors and researchers, shaping the future of manufacturing processes worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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