The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Jun. 27, 2022
Ebara Corporation, Tokyo, JP;
Tomoatsu Ishibashi, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
A substrate drying device is provided that can suppress occurrence of a micro size defect (for example, a defect having a defect size of 20 nm or less). A substrate drying deviceincludes a substrate holding unitwhich holds a substrate W, a gas generatorwhich generates a drying gas G including at least IPA vapor and for drying the substrate W, and a drying gas nozzlewhich supplies the drying gas G to the surface WA of the substrate W. A filterfor filtering the drying gas G is provided in the gas generator. A defect size D allowed in a defect test after the drying of the substrate W is set to 20 nm or less and a ratio D/F of the defect size D and a filter size F of the filteris set to 4 or more.