Company Filing History:

8 out of 1,787

Kla Tencor Corporation

patents

2 out of 641

Kla-tencor Technologies Corporation

patents

1 out of 832,680

Other

patents

Years Active: 2008-2017

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9601393 - Selecting one or more parameters for inspection of a wafer (2017-03-21),

2. 9483819 - Contour-based array inspection of patterned defects (2016-11-01),

3. 9318395 - Systems and methods for preparation of samples for sub-surface defect review (2016-04-19),

4. 9310316 - Selecting parameters for defect detection methods (2016-04-12),

5. 9087367 - Determining design coordinates for wafer defects (2015-07-21),

6. 8669523 - Contour-based defect detection using an inspection apparatus (2014-03-11),

7. 8594823 - Scanner performance comparison and matching using design and defect data (2013-11-26),

8. 8135204 - Computer-implemented methods, carrier media, and systems for creating a defect sample for use in selecting one or more parameters of an inspection recipe (2012-03-13),

9. 8000922 - Methods and systems for generating information to be used for selecting values for one or more parameters of a detection algorithm (2011-08-16),

10. 7522664 - Remote live video inspection (2009-04-21),

11. 7345753 - Apparatus and methods for analyzing defects on a sample (2008-03-18),

Title: Michael John Van Riet: Innovator in Wafer Inspection Technologies

Introduction

Michael John Van Riet is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of wafer inspection technologies, holding a total of 11 patents. His work has advanced the methods and systems used in the semiconductor industry.

Latest Patents

Among his latest patents, one focuses on selecting one or more parameters for the inspection of a wafer. This patent describes computer-implemented methods, computer-readable media, and systems designed for this purpose. Another significant patent involves contour-based array inspection of patterned defects. This method generates a reference image using a previously determined defect-free cell image. A reference contour image is then created, which includes contours of the reference image. This contour image is utilized to detect defects in the array of cells on the substrate. Other embodiments, aspects, and features are also disclosed in his patents.

Career Highlights

Michael has worked with prominent companies in the industry, including Kla Tencor Corporation and Kla-Tencor Technologies Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in wafer inspection.

Collaborations

Some of his notable coworkers include Chien-Huei (Adam) Chen and Barry Becker. Their collaboration has contributed to the advancement of technologies in the field.

Conclusion

Michael John Van Riet's contributions to wafer inspection technologies have made a significant impact in the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in this field.

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