The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2015
Filed:
Aug. 31, 2012
Ellis Chang, Saratoga, CA (US);
Michael J. Van Riet, Sunnyvale, CA (US);
Allen Park, San Jose, CA (US);
Khurram Zafar, San Jose, CA (US);
Santosh Bhattacharyya, San Jose, CA (US);
Ellis Chang, Saratoga, CA (US);
Michael J. Van Riet, Sunnyvale, CA (US);
Allen Park, San Jose, CA (US);
Khurram Zafar, San Jose, CA (US);
Santosh Bhattacharyya, San Jose, CA (US);
KLA-Tencor Corp., Milpitas, CA (US);
Abstract
Methods and systems for determining design coordinates for defects detected on a wafer are provided. One method includes aligning a design for a wafer to defect review tool images for defects detected in multiple swaths on the wafer by an inspection tool, determining a position of each of the defects in design coordinates based on results of the aligning, separately determining a defect position offset for each of the multiple swaths based on the swath in which each of the defects was detected (swath correction factor), the design coordinates for each of the defects, and a position for each of the defects determined by the inspection tool, and determining design coordinates for the other defects detected in the multiple swaths by the inspection tool by applying the appropriate swath correction factor to those defects.