Kyoto, Japan

Masashi Kanaoka

This inventor holds 17 USPTO granted patents and 4 published patent applications, primarily in Substrate Processing. Top assignees: Sokudo Co., Ltd., Screen Semiconductor Solutions Co., Ltd., Screen Holdings Co., Ltd.. Active years: 2009-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masashi Kanaoka. Retrieved from https://idiyas.com/inventor/masashi-kanaoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 100.0

Average Co-Inventor Count = 4.6

ph-index = 4

Forward Citations = 73(Granted Patents)


Location History:

  • Kamigyo-ku, JP (2013)
  • Kyoto, JP (2009 - 2019)

Company Filing History:


Years Active: 2009-2019

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Areas of Expertise:
Substrate
Processing
Drying Techniques
Apparatus Designs
Gas Discharge
Liquid Layer
Multi-Speed Drying
Rinse Liquid Supplier
Rotated Substrate
Temporary Stop
Drying Core
17 patents (USPTO):Explore Patents

Title: Masashi Kanaoka: Innovator in Substrate Treatment Technologies

Introduction

Masashi Kanaoka, a distinguished inventor based in Kyoto, Japan, has made significant contributions to the field of substrate processing technology. With a remarkable portfolio of 17 patents, Kanaoka has established himself as a leader in innovative methods and apparatuses that enhance substrate treatment processes.

Latest Patents

Among his notable inventions, Kanaoka's recent patents include a "Substrate Treating Method" and a "Substrate Processing Apparatus and Substrate Processing Method." The substrate treating method involves a determining step to establish treating conditions for hydrophobizing the surface of a substrate, focusing on the dissolved area size in a resist pattern. This meticulous approach aims to optimize the treatment before the formation of a resist film on the substrate. The substrate processing apparatus features a unique rotation holder that holds and rotates the substrate in a horizontal position, allowing a coating liquid to be efficiently applied while simultaneously managing the removal of excess fluid with a first removal liquid.

Career Highlights

Kanaoka's career highlights include valuable tenures at various prestigious companies. He worked at Sokudo Co., Ltd. and Screen Semiconductor Solutions Co., Ltd., where he honed his expertise in substrate processing technology and innovation.

Collaborations

Throughout his career, Kanaoka collaborated with prominent colleagues in the field, including Shuichi Yasuda and Tadashi Miyagi. These collaborations have contributed to the advancement of substrate treatment technologies and the refinement of inventive methodologies.

Conclusion

Masashi Kanaoka's innovative spirit and dedication to advancing substrate treatment technologies have firmly established him as a key figure in his field. With a growing portfolio of patents and a history of impactful collaborations, Kanaoka continues to contribute to the evolution of substrate processing, setting a high standard for innovation in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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