The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Sep. 11, 2008
Tadashi Miyagi, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Masakazu Sanada, Kyoto, JP;
Tadashi Miyagi, Kyoto, JP;
Masashi Kanaoka, Kyoto, JP;
Kazuhito Shigemori, Kyoto, JP;
Shuichi Yasuda, Kyoto, JP;
Masakazu Sanada, Kyoto, JP;
Screen Semiconductor Solutions Co., Ltd., Kyoto, JP;
Abstract
After a substrate is cleaned, a liquid layer of a rinse liquid is formed so as to cover one surface of the substrate. Then, a liquid supply nozzle moves outward from above the center of the substrate. The liquid supply nozzle is stopped once at the time point where it moves by a predetermined distance from above the center of the substrate. In this time period, the liquid layer is divided within a thin layer region by a centrifugal force, so that a drying core is formed at the center of the liquid layer. Thereafter, the liquid supply nozzle moves outward again, so that a drying region where no rinse liquid exists expands on the substrate with the drying core as its starting point.