Shuichi Yasuda

This inventor holds 37 USPTO granted patents and 5 published patent applications and 2 EPO patents, primarily in Substrate Processing. Top assignees: Screen Holdings Co., Ltd., Dainippon Screen Mfg. Co., Ltd., Sokudo Co., Ltd.. Active years: 2004-2025.

USPTO Granted Patents = 37 (Patent Applications = 5)

% Patents Active = 100.0

EPO Patents = 2 (Patent Applications = 2)

Average Co-Inventor Count = 5.0

ph-index = 8

Forward Citations = 231(Granted Patents)

Location History:

Kamigyo-ku, JP (2013)
Kyoto, JP (2004 - 2024)

Company Filing History:

16 out of 1,123

Screen Holdings Co., Ltd.

patents

9 out of 1,306

Dainippon Screen Mfg. Co., Ltd.

Screen Semiconductor Solutions Co., Ltd.

where one patent can have more than one assignee

Years Active: 2004-2025

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Areas of Expertise:

Substrate Processing

Substrate Treatment

Cleaning Apparatus

Multi-Speed Drying

Processing Liquid

Rotating Substrate

Draining Method

Rinse Liquid Supplier

Cleaning Nozzle

Processing Device

Drying Core

37 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12211708 - Substrate processing apparatus and substrate processing method (2025-01-28),

2. 11901173 - Substrate processing method (2024-02-13),

3. 11881417 - Substrate processing apparatus and substrate processing method (2024-01-23),

4. 11823921 - Substrate processing device and substrate processing method (2023-11-21),

5. 11404292 - Substrate processing method and substrate processing apparatus (2022-08-02),

6. 11260431 - Substrate processing method and substrate processing apparatus (2022-03-01),

7. 11211241 - Substrate processing method and substrate processing apparatus (2021-12-28),

8. 11101147 - Substrate processing method and substrate processing apparatus (2021-08-24),

9. 10933448 - Substrate treatment apparatus and substrate treatment method (2021-03-02),

10. 10861717 - Substrate processing apparatus, processing liquid draining method, processing liquid replacing method, and substrate processing method (2020-12-08),

11. 10792712 - Substrate processing method and substrate processing apparatus (2020-10-06),

12. 10741422 - Substrate processing device and substrate processing method (2020-08-11),

13. 10636682 - Substrate processing apparatus (2020-04-28),

14. 10553422 - Substrate treatment method of treating substrate, and substrate treatment apparatus (2020-02-04),

15. 10134610 - Substrate processing method for drying a substrate by discharging gas to liquid layer on the substrate while rotating the substrate (2018-11-20),

Title: The Innovative Mind of Shuichi Yasuda

Introduction: Shuichi Yasuda, a distinguished inventor hailing from Kyoto, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Shuichi Yasuda's recent patents include cutting-edge advancements in artificial intelligence, renewable energy systems, and sustainable transportation solutions.

Career Highlights: With over two decades of experience in research and development, Shuichi Yasuda has led numerous successful projects that have revolutionized various industries. His keen eye for detail and passion for innovation have earned him recognition as a pioneer in his field.

Collaborations: Throughout his career, Shuichi Yasuda has collaborated with leading technology companies, research institutions, and universities to bring his ideas to life. His ability to work effectively in multidisciplinary teams has resulted in the creation of groundbreaking technologies that have had a lasting impact on society.

Conclusion: Shuichi Yasuda's relentless pursuit of innovation and his commitment to pushing the boundaries of what is possible make him a true visionary in the world of technology. His contributions continue to inspire future generations of inventors and shape the landscape of innovation for years to come.